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Uncertainty propagation of atmospheric correction parameters
The main objective of this research was to quantify the propagation of uncertainty in a layered processing system as applied in processing and arcgiving facilities. A framework is presented that is suited for the purpose. Practical uncertainty estimates are then obtained by estimating a reflectance product using there parameters: column water vapour, aerosol optical depth, and the adjacency range. I Demonstrate the propagation of uncertainty from the reflectance product to applicatin products, by focusing on unmixing i.e retrieving materials and their proportional abundances presnt in each pixeel.
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